FAB front-end process control equipment CFW920-Optical quantity detection equipment for wafer manufacturing series-Chengfeng_Wafer Maker_Packaging AOI

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FAB front-end process control equipment CFW920

CFW920 is an optical inspection equipment used for FAB front-end process control, applied in multiple process stations such as ADI/AEI/CMP, to help customers discover key graphic defects that affect yield during the process development and production capacity improvement stages, and improve yield. CFW920 has a defect sensitivity of up to 200nm, dual channel detection throughput, flexible and easy-to-use recipe management function, and deep learning based ADC algorithm, helping customers quickly enter the HVM stage of their production line.

CFW920
Application scenarios	ADI/AEI/POST CMP
Equipment functions	√ Balancing high throughput with dual channel detection
	√ Sensitivity and throughput benchmarking against foreign competitors
	√ ADC automatic defect classification - based on deep learning algorithms
	Recipe supports multiple detection zones and can set different filtering parameters
Equipment features	Discovering minor defects in the front-end process and improving yield
Specific parameters/specifications	√ Sensor: CCD
	√ Optical path: Light dark field composite
	√ Objective magnification: 5X/10X/20X
	√ Resolution (BF): 0.2um