CFW921 is a high specification FAB front-end nano pattern detection device that can benchmark against foreign competitors Kxx machines. It is equipped with dual TDI sensors, which can achieve synchronous imaging of bright and dark fields. One scan can simultaneously capture and detect images of both bright and dark fields, and can scan and detect more defects. It is suitable for multiple process stations such as ADI/AEI/CMP in FAB front-end.

It can meet the application scenarios of high sensitivity and high detection rate of defects.