Mask template manufacturing optical quantity detection equipment series

Zhuhai Chengfeng Electronic Technology Co., Ltd. was established in 2015, headquartered in Zhuhai. The company has set up branches and offices in Suzhou, Hefei, Shanghai, Beijing, Shenzhen, Chengdu, Wuhan, Changsha, Thailand, Singapore and other domestic and foreign places.

Chengfeng Technology focuses on the research and development, production, and sales of semiconductor optical detection equipment, with completely independent intellectual property rights. Currently, it has mastered multiple sets of optical microscopy imaging technologies, and has accumulated years of core graphic detection algorithms such as D2B/D2D/GDD in the full stack. It has launched multiple mass production models in the fields of wafer manufacturing and mask manufacturing, providing comprehensive support for process monitoring and yield improvement in the semiconductor industry.


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Wafer mask detection equipment CFY210
Mask template manufacturing optical quantity detection equipment series

CFY210 is an AOI equipment used in MaskShop production process inspection and shipment inspection. Chengfeng's photomask detection technology can help photomask manufacturers identify photomask particle defects and graphic defects. CFY210 supports multiple detection modes, SMIF automatic loading and unloading, and high-speed motion platform, which can meet the requirements of detection stability and production capacity, as well as ultra-high cleanliness, thereby helping customers improve yield.

Particle detection: Before applying the film, the highest resolution can reach 0.2um

Graphic detection: supports core and peripheral areas, with a maximum resolution of 0.2um


CFY210

Specific parameters/specifications

√ Optical path: transmission/reflection/scattering

√ Algorithm: D2B/D2D

√ Resolution: 0.2um

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UV Reticle defect detection equipment CFY401
Mask template manufacturing optical quantity detection equipment series

CFY401 is a UV Reticle detection device used in MaskShop production process inspection and shipment inspection. Chengfeng's photomask detection technology can help photomask manufacturers identify photomask particle defects and graphic defects. CFY401 supports multiple detection modes, SMIF automatic loading and unloading, and high-speed motion platform, which can meet the requirements of detection stability and production capacity, as well as ultra-high cleanliness, thereby helping customers improve yield.

Particle detection: Before applying the film, the highest resolution can reach 0.13um

Graphic detection: The highest resolution can reach 0.13um


CFY401

Specific parameters/specifications

√ Optical path: transmission/reflection/scattering

√ Algorithm: D2B/D2D

√ Resolution: 0.13um


Interested in or having questions about this product?

DUV Reticle defect detection equipment CFY501
Mask template manufacturing optical quantity detection equipment series

CFY501 is a DUV ultra-high resolution Reticle detection device currently under development and will be launched in 2025. Stay tuned.


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